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CRY-Al2O3

Sapphire single crystal substrate/wafer

Roughness: Ra<3A(0.3nm)
(Epi-ready)

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CRY-Ge-N/Sb

Germanium Wafer Ge

N type, Sb doped Ge wafer 

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CRY-Ge-P/Ga

Germanium Wafer Ge

P type Ga doped Ge wafer

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CRY-Ge-UD

Germanium Wafer Ge

Intrinsic, undoped 

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CRY-SOI

Silicon-On-Insulator (SOI) wafer

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CRY-Si-B

Silicon Wafer/Substrate Si

Boron doped

 

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CRY-Si-P/As

Silicon Wafer/Substrate Si

Phosphorous doped or Arsenic doped

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CRY-Si-UD

Silicon Wafer/Substrate Si

undoped 

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CRY-SiO2/Si

Thermal oxide Silicon wafer (SiO2/Si)

Boron, Phosphorous, Arsenic doped or undoped

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